Tetrafluoromethane

Tetrafluoromethane

Halocarbon 14 - Tetrafluoromethane (CF4) is widely used in plasma etching, surface cleaning, solar cell manufacturing, and laser technology. Purity: 99.9%-99.999%. CAS: 75-73-0, UN: UN1982.

Category: High-Purity Gases

For more product details, please contact us!

+86-757-81033032

Product Details

Product Overview

PropertyValue
Product NameHalocarbon 14 - Tetrafluoromethane CF4
CAS Number75-73-0
UN NumberUN1982
Packing40L, 44L, 47L, 50L cylinder (GB, ISO, DOT)
Filling Content30kg/cyl
Shipped asCompressed Gas

Specifications

Items99.9%99.999%
CF499.9%99.999%
O2≤100 ppmv≤1.0 ppmv
N2≤400 ppmv≤4.0 ppmv
CO2≤80 ppmv≤0.5 ppmv
CO≤50 ppmv≤0.5 ppmv
CH4≤50 ppmv≤0.5 ppmv
Other Halocarbons≤100 ppmv≤2.0 ppmv
H2O≤10 ppmv≤2.0 ppmv
SF6≤15 ppmv≤1.0 ppmv
Acidity as HF≤1.0 ppmv≤0.1 ppmv

Transportation & Technical Information

DOT Classification2.2 - Nonflammable Gas
CGA/DISS/JIS320/716/W22-14L
Molecular Weight88.01 g/mol
Specific Gravity (air=1)3.04
Critical Temperature-45.65 °C

Applications

One of the largest consumption kinds of plasma etching gases in microelectronics industry, also widely used in surface cleaning of electronic devices, manufacture of solar cells, laser technology, gas phase insulation, subzero refrigeration, leakage inspection agent and decontaminant of manufacture of printed circuits.