Fluoromethane

Fluoromethane

Halocarbon 41 - Fluoromethane (CH3F) is used in semiconductor manufacturing as a plasma etching gas of silicon compound films. Purity: 99.5%-99.995%. CAS: 593-53-3, UN: UN2810.

Category: High-Purity Gases

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Product Details

Product Overview

PropertyValue
Product NameHalocarbon 41 - Fluoromethane CH3F
CAS Number593-53-3
UN NumberUN2810
Packing40L, 47L, 50L cylinder (GB, ISO, DOT)
Filling Content40kg/cyl
Shipped asLiquefied Gas

Specifications

Items99.5%99.995%
CH3F99.5%99.995%
O2≤20 ppbv≤5 ppmv
N2≤70 ppbv≤20 ppmv
CO2-≤10 ppmv
CO-≤10 ppmv
CH4-≤5 ppmv
H2O≤10 ppbv≤2 ppmv

Transportation & Technical Information

DOT Classification2.1 - Inflammable Gas
CGA/DISS/JIS350/724/W22-14L
Molecular Weight34.03 g/mol
Specific Gravity (air=1)1.18
Critical Temperature45 °C

Applications

In semiconductor manufacturing, fluoromethane is a plasma etching gas of silicon compound films.