Product Overview
| Property | Value |
|---|
| Product Name | Halocarbon 23 - Trifluoromethane CHF3 |
| CAS Number | 75-46-7 |
| UN Number | UN 1984 |
| Packing | 40L, 44L, 47L, 50L cylinder (GB, ISO, DOT) |
| Filling Content | 30kg/cyl |
| Shipped as | Liquefied Gas |
Specifications
| Items | Specifications |
|---|
| CHF3 | 99.9995% |
| O2 | ≤1.0 ppmv |
| N2 | ≤4.0 ppmv |
| CO2 | ≤0.5 ppmv |
| CO | ≤0.5 ppmv |
| CH4 | ≤0.5 ppmv |
| Other Organics | ≤2.0 ppmv |
| H2O | ≤2.0 ppmv |
| Acidity as HCl | ≤0.1 ppmv |
Transportation & Technical Information
| DOT Classification | 2.2 - Nonflammable Gas |
| CGA/DISS/JIS | 660/716/W22-14L |
| Molecular Weight | 70 g/mol |
| Specific Gravity (air=1) | 2.436 |
| Critical Temperature | 178.43 °C |
Applications
Trifluoromethane (CHF3) is used in plasma etching of silicon oxide or nitride layers. CHF3 is also a low temperature refrigerant, replacing chlorodifluoromethane (R22 or CHF2Cl).
