Nitrogen Trifluoride

Nitrogen Trifluoride

Nitrogen Trifluoride (NF3) is used for cleaning CVD chambers and etching vapor deposition layers in semiconductor, TFT-LCD and solar cell production. Purity: 99.99%. CAS: 7783-54-2, UN: UN2451.

Category: High-Purity Gases

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Product Details

Product Overview

PropertyValue
Product NameNitrogen Trifluoride NF3
CAS Number7783-54-2
UN NumberUN 2451
Packing40L, 47L, 50L cylinder (GB, ISO, DOT)
Filling Content20kg/cyl
Shipped asLiquefied Gas

Specifications

ItemsSpecifications
NF399.99%
O2≤3.0 ppmv
N2≤5.0 ppmv
CO2≤1.0 ppmv
CO≤1.0 ppmv
CH4≤1.0 ppmv
H2O≤1.0 ppmv
CF4≤1.0 ppmv
N2O≤2.0 ppmv
SF6≤1.0 ppmv
HF≤1.0 ppmv

Transportation & Technical Information

DOT Classification2.2 - Nonflammable Gas and Oxidizer
DISS/JIS/DIN477640/W22-14L/NO.6
Molecular Weight71 g/mol
Specific Gravity (air=1)2.46
Critical Temperature-39.15 °C

Applications

Used for cleaning CVD Chamber or etching vapor deposition layer (film) during the production process of semiconductor, TFT-LCD and solar cell.